Search results for "Combustion chemical vapor deposition"
showing 2 items of 2 documents
Metal-organic chemical vapor deposition of Cr2O3 and Nd2O3 coatings. Oxide growth kinetics and characterization
2000
Thin oxide films of Cr2O3 and Nd2O3 were prepared, using Metal-Organic Chemical Vapor Deposition (MOCVD) technique, to protect stainless steels against corrosion at high temperature. The conditions of precursor volatilization were studied by thermogravimetry. Deposited film growth kinetics depended on the deposition parameters, particularly substrate temperature, gas flow rate and location of substrate in the coating reactor. The influence of the deposition parameters on the deposition rate and the uniformity of the films is discussed. The oxide films were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), transmission electron microscopy (TEM) and atomic force mi…
Vacuum arc deposition of protective layers on glass and polymer substrates
2001
Abstract Vacuum arc deposition allows one to deposit various coatings on insulating and temperature-sensitive substrates (like polymers). An advantage of the vacuum arc deposition technique is the low substrate temperature during the deposition process. A vacuum arc deposition apparatus for the coating of large-area substrates has been developed. Ti, TiN, TiO 2 and diamond-like single and multilayer coatings have been deposited on plastic and glass substrates. The vacuum arc technology permits formation of multilayer colour filters of high uniformity on substrates with dimensions up to 2000×1400 mm 2 . The microstructure, chemical composition and optical properties of the deposited coatings…